首页> 外国专利> Device and method for making photomask assembly and photodetector device having light-collecting optical microstructure

Device and method for making photomask assembly and photodetector device having light-collecting optical microstructure

机译:具有集光光学微结构的光掩模组件和光检测器装置的制造装置和方法

摘要

An optical mask can be made by providing a transparent mask substrate; depositing a first layer of opaque material, forming an aperture in the first layer; depositing a second layer of transparent material, depositing a third layer of transparent material; patterning the third layer to produce a disc-shaped region, heating the third layer until the disc-shaped region reflows into a lens-shaped region and cross-links, depositing a fourth layer, patterning the fourth layer to produce a cavity extending to the surface of the lens-shaped region, and dry etching the end of the cavity until the second layer develops a shape corresponding to the lens-shaped region.
机译:可以通过提供透明的掩模基板来制造光学掩模。沉积不透明材料的第一层,在第一层中形成孔;沉积第二层透明材料,沉积第三层透明材料;图案化第三层以产生圆盘状区域,加热第三层,直到圆盘状区域回流到透镜状区域并交联,沉积第四层,图案化第四层以产生延伸到第二层的空腔在该透镜形区域的表面上进行干蚀刻,直到第二层形成与该透镜形区域相对应的形状为止。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号