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Through-silicon via (TSV)-based devices and associated techniques and configurations

机译:基于硅通孔(TSV)的设备以及相关技术和配置

摘要

Embodiments of the present disclosure are directed toward through-silicon via (TSV)-based devices and associated techniques and configurations. In one embodiment, an apparatus includes a die having active circuitry disposed on a first side of the die and a second side disposed opposite to the first side, a bulk semiconductor material disposed between the first side and the second side of the die and a device including one or more of a capacitor, resistor or resonator disposed in the bulk semiconductor material, the capacitor, resistor or resonator including one or more TSV structures that extend through the bulk semiconductor material, an electrically insulative material disposed in the one or more TSV structures and an electrode material or resistor material in contact with the electrically insulative material within the one or more TSV structures.
机译:本公开的实施例针对基于硅通孔(TSV)的设备以及相关联的技术和配置。在一个实施例中,一种设备包括:管芯,该管芯具有设置在管芯的第一侧上的有源电路和与该第一侧相对的第二侧,以及设置在管芯的第一侧和第二侧之间的体半导体材料。包括设置在块状半导体材料中的电容器,电阻器或谐振器中的一种或多种,​​电容器,电阻器或谐振器包括延伸通过块状半导体材料的一个或多个TSV结构,布置在一个或多个TSV结构中的电绝缘材料在一个或多个TSV结构内,与电绝缘材料接触的电极材料或电阻材料。

著录项

  • 公开/公告号US9786581B2

    专利类型

  • 公开/公告日2017-10-10

    原文格式PDF

  • 申请/专利权人 INTEL CORPORATION;

    申请/专利号US201414203415

  • 发明设计人 TELESPHOR KAMGAING;

    申请日2014-03-10

  • 分类号H01L29/84;H01L23/48;H01L23/64;H01L49/02;B81C1;H01L27/06;

  • 国家 US

  • 入库时间 2022-08-21 13:43:23

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