Provided are a photoresist, a quantum dot layer patterning method, a QLED, a quantum dot colour film and a display apparatus, which may solve the problem that an existing patterning method may disrupt quantum dots. The quantum dot layer patterning method comprises the following steps: forming a hydrophilic photoresist pattern, comprising: forming a photoresist (2) material layer on a substrate (1) using a photoresist, patterning the photoresist (2) material layer to form a photoresist pattern, and performing a hydrophilic treatment on the photoresist; spreading quantum dots (3); removing the quantum dots retained on the photoresist pattern; and stripping the photoresist pattern. The quantum dot layer patterning method can improve the hydrophilic performance of a photoresist, and reduce the adhesion of an oleophilic quantum dot to the photoresist.
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