FILM THICKNESS CONTROL SYSTEM, FILM THICKNESS CONTROL METHOD, VAPOR DEPOSITION DEVICE AND VAPOR DEPOSITION METHOD

摘要

A vapor deposition device (100) film thickness control system, comprising: a moving device (01), a film thickness measuring apparatus (3) and computer, wherein, the film thickness measuring apparatus (3) is installed on the moving device (01), and is connected to the computer, and is for acquiring, from the computer, coordinates of a position to be measured of a substrate (4) to be measured and sending to the computer the measured actual film thickness of the position to be measured. The computer is for calculating a new compensation value on the basis of the actual film thickness, a preset film thickness and a current compensating value when the actual film thickness does not exceed a preset film thickness error range, and sending the new compensating value to the vapor deposition device (100) as a compensating vapor deposition reference. Further provided is a film thickness control method, vapor deposition device (100) and vapor deposition method.