CVD- PVD- DEVICE AND METHOD FOR PROVIDING A PROCESS GAS MIXTURE TO A CVD OR PVD COATING DEVICE

摘要

The invention relates firstly to a gas supply with inlet channels 22, an overflow barrier 14 and a gas outlet channel 8, said inlet channels each comprising a gas source 21 ) By means of one or more first gas-deflecting members (13) in the first mixing chamber (12), in order to supply the individual gas flows provided by the first gas- The individual gas flows are deflected once or several times and the individual gas flows are mixed together and a first gas flow consisting of all individual gas flows discharged from the first mixing chamber 12 flows over the overflow barrier Flows into the second mixing chamber 15 and the first gas flow is deflected once or several times in the second mixing chamber, in particular by the second gas deflection members 16, From the second mixing chamber 15, the gas flow was provided to discharge into the gas inlet member 5 of CVD- or PVD- coating device (1). The gas supply device is improved such that the effective path lengths of the individual gas flows from the gas sources 21 to the gas inflow member 5 have the same length. The present invention also relates to a method for supplying process gases to a gas inlet member (9) of a CVD- or PVD-coating apparatus, wherein the gases (21) and the gas inlet member (5) It is important that the effective residence times differ by up to 10 milliseconds.