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EVALUATION METHOD FOR BULK SILICON CARBIDE SINGLE CRYSTALS AND REFERENCE SILICON CARBIDE SINGLE CRYSTAL USED IN SAID METHOD
EVALUATION METHOD FOR BULK SILICON CARBIDE SINGLE CRYSTALS AND REFERENCE SILICON CARBIDE SINGLE CRYSTAL USED IN SAID METHOD
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机译:块状碳化硅单晶的评估方法及引用方法中引用的碳化硅单晶
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摘要
A method for relatively evaluating the degree of lattice strain in a plurality of bulk SiC single crystals, and a SiC single crystal for reference used in the method. The Raman shift R ref of the reference silicon carbide single crystal serving as a reference is measured and the Raman shift R n of each of the plurality of bulk silicon carbide single crystals to be evaluated is measured to calculate the respective Raman shift R n and the Raman shift R ref And relatively comparing the difference to evaluate the magnitude of the lattice strain in the plurality of bulk silicon carbide single crystals to be evaluated. The method of evaluating the bulk monocrystalline silicon single crystal is also used in this method, And a surface roughness Ra of not more than 1 nm, a micropipe density of not more than 1.0 pcs / cm 2, and a potential of not more than 1.0 psi / cm 2, And is a reference silicon carbide single crystal having a density of 5 x 10 3 / cm 2 or less.
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机译:一种用于相对地评估多个块状SiC单晶中的晶格应变程度的方法,并且该方法中使用了SiC单晶作为参考。测量用作参考的参考碳化硅单晶的拉曼位移R ref Sub>,并且将多个块状碳化硅单晶中的每一个的拉曼位移R n Sub>进行测量。测量被测物以计算各自的拉曼位移R n Sub>和拉曼位移R ref Sub>并相对比较差异以评估多个块体中晶格应变的大小要评估的碳化硅单晶。该方法中还使用了评估块状单晶硅单晶的方法,并且表面粗糙度Ra不大于1nm,微管密度不大于1.0pcs / cm 2,电势不大于1.0 psi / cm 2,并且是密度为5 x 10 3 Sup> / cm 2或更小的参考碳化硅单晶。
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