Method for preparing anti-reflection surface using plasma etching and substrate having anti-reflection surface

摘要

The present invention relates to a method for manufacturing an anti-reflection surface and a substrate having the anti-reflection surface. The anti-reflection surface can secure an increase in durability, excellent light transmittance, and a reflection prevention effect, and can assign functionality like easy cleaning, fouling resistant properties, scratch resistant properties, and so on by controlling, into various structures, an anti-reflection structural layer formed through repeated control of plasma dry etching and inorganic deposition.