Method for preparing anti-reflection surface using plasma etching and substrate having anti-reflection surface

摘要

The present invention can improve the durability and the excellent light transmission and anti-reflection effect by controlling the anti-reflection structure layer formed through repetitive control of the plasma dry etching and the inorganic material deposition to various structures, A method of manufacturing an antireflection surface capable of imparting functionality such as scratch resistance, and a substrate on which an antireflection surface is formed.