首页> 外国专利> ELECTROLYTIC POLISHING LIQUID, AND ELECTROLYTIC POLISHING METHOD USING SAME

ELECTROLYTIC POLISHING LIQUID, AND ELECTROLYTIC POLISHING METHOD USING SAME

机译:电解抛光液,以及使用该电解抛光液的电解抛光方法

摘要

Disclosed are an electrolytic polishing liquid, and an electrolytic polishing method using the same. The electrolytic polishing liquid comprises a first electrolyte containing 110-200 mL/L of 2-butoxyethanol, 700-750 mL/L of a solvent, and 80-100 mL/L of distilled water, and a second electrolyte containing 40-60 mL/L of perchloric acid, and 40-50 mL/L of distilled water. The electrolytic polishing method comprises the following steps: collecting samples; placing the samples at an upper side of a mask on which a hole is formed; and spraying the electrolytic polishing liquid onto the samples through the hole. The present invention aims to provide the electrolytic polishing liquid, which effectively detects a microstructure, and the electrolytic polishing method using the same.;COPYRIGHT KIPO 2017
机译:公开了一种电解抛光液以及使用该电解抛光液的电解抛光方法。该电解抛光液包括:第一电解质,其包含110-200mL / L的2-丁氧基乙醇; 700-750mL / L,溶剂;和80-100mL / L的蒸馏水;以及第二电解质,其包含40-60mL / mL。 / L高氯酸和40-50 mL / L蒸馏水。电解抛光方法包括以下步骤:收集样品;以及将样品放置在形成有孔的掩模的上侧。通过孔将电解抛光液喷在样品上。本发明的目的是提供有效检测微观结构的电解抛光液及其使用的电解抛光方法。; COPYRIGHT KIPO 2017

著录项

  • 公开/公告号KR20170074055A

    专利类型

  • 公开/公告日2017-06-29

    原文格式PDF

  • 申请/专利权人 POSCO;

    申请/专利号KR20150183062

  • 申请日2015-12-21

  • 分类号C09G1/02;C25F3/16;

  • 国家 KR

  • 入库时间 2022-08-21 13:27:10

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