首页> 外国专利> METHOD FOR GROWING MONOCRYSTALLINE SILICON AND MONOCRYSTALLINE SILICON INGOT PREPARED THEREBY

METHOD FOR GROWING MONOCRYSTALLINE SILICON AND MONOCRYSTALLINE SILICON INGOT PREPARED THEREBY

机译:一种单晶硅的生长方法及由此制备的单晶硅锭

摘要

Provided is a method for growing monocrystalline silicon comprising the following steps: forming a silicon-containing solution in a crucible by applying a Czochralski method; and drawing a solution for monocrystalline silicon growth. While forming the silicon-containing solution including heavy hydrogen-injection nitride-deposition silicon and monocrystalline silicon, gas containing argon is introduced, and a magnetic field is applied during the drawing step. Moreover, provided is a method for manufacturing a wafer based on the monocrystalline silicon.;COPYRIGHT KIPO 2017
机译:提供一种生长单晶硅的方法,其包括以下步骤:通过应用切克劳斯基方法在坩埚中形成含硅溶液;并为单晶硅生长提供解决方案。在形成包括重氢注入氮化物沉积硅和单晶硅的含硅溶液的同时,引入包含氩气的气体,并且在拉伸步骤期间施加磁场。此外,提供了一种基于单晶硅的晶片的制造方法。; COPYRIGHT KIPO 2017

著录项

  • 公开/公告号KR20170103601A

    专利类型

  • 公开/公告日2017-09-13

    原文格式PDF

  • 申请/专利权人 ZING SEMICONDUCTOR CORPORATION;

    申请/专利号KR20160098817

  • 发明设计人 CHANG RICHARD R.US;XIAO DEYUANCN;

    申请日2016-08-03

  • 分类号C30B15/04;C30B15/10;C30B15/14;C30B15/20;C30B29/06;C30B33/08;H01L21/02;

  • 国家 KR

  • 入库时间 2022-08-21 13:26:41

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