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Transparent hard coating film with high hardness properties and Method of Manufacturing The Same

机译:具有高硬度特性的透明硬质涂膜及其制造方法

摘要

The present invention relates to a transparent hard coating film having a hard-hardness property and a method of manufacturing the same and, more specifically, relates to a transparent hard coating film having a hard-hardness property providing excellent transparency, scratch resistance, water repellency, antifouling properties, and anti-fingerprint property; and to a method of manufacturing the same. The present invention provides the method of manufacturing the hard coating film comprising a step of sputtering using a fluorine-based polymer composite target prepared by a mixture of conductive carbon nanoparticles and a fluorine-based polymer on a flexible film substrate. The step of sputtering uses the fluorine-based polymer composite target which may be deposited and formed by RF, MF, or DC sputtering and includes conductive carbon nanoparticles; thereby solving problems such as damage to the fluorine-based polymer target caused by conventional degradation generated due to high energy applied when a fluorine-based polymer is deposited, and low deposition rate due to the generation of plasma with efficiency relatively lower when compared to an applied voltage.
机译:透明硬质涂膜及其制造方法技术领域本发明涉及一种具有硬质性的透明硬质涂膜及其制造方法,更具体地,涉及一种具有优异的透明性,耐刮擦性,疏水性的硬质性的透明硬质涂膜。 ,防污性能和防指纹性能;以及制造方法。本发明提供了一种制备硬涂膜的方法,该方法包括以下步骤:在柔性膜基材上使用由导电碳纳米颗粒和氟基聚合物的混合物制备的氟基聚合物复合靶材进行溅射。溅射步骤使用可以通过RF,MF或DC溅射沉积和形成的氟基聚合物复合靶,并且包括导电碳纳米粒子;从而解决了诸如由于沉积氟基聚合物时施加的高能量所产生的常规降解而导致的对氟基聚合物靶材的损坏,以及由于等离子体产生效率低而导致的等离子体生成所导致的低沉积速率等问题。施加电压。

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