首页> 外国专利> RNA Dicer Substrate RNA Nanostructures for Enhanced Gene Silencing Effect and Process for Preparation Thereof

RNA Dicer Substrate RNA Nanostructures for Enhanced Gene Silencing Effect and Process for Preparation Thereof

机译:用于增强基因沉默效果的RNA切丁机底物RNA纳米结构及其制备方法

摘要

The present invention relates to an RNA nanostructure as a dicer substrate ensuring enhanced gene silencing effects, and a production method thereof. The RNA nanostructure contains a plurality of RNA interference (RNAi) sequences which can be the same or different from each other in a single RNA nanostructure, thereby effectively, simultaneously, and selectively regulating expression of a plurality of genes. In addition, by regulating opening or closing state of the RNA nanostructure in the production of the RNA nanostructure, it is possible to intentionally regulate activation of RNAi sequences.
机译:RNA纳米结构及其制备方法技术领域本发明涉及作为确保切割基因的沉默效果增强的切丁酶底物的RNA纳米结构及其制备方法。 RNA纳米结构包含多个RNA干扰(RNAi)序列,在单个RNA纳米结构中它们可以彼此相同或不同,从而有效,同时和选择性地调节多个基因的表达。另外,通过在RNA纳米结构的产生中调节RNA纳米结构的打开或闭合状态,可以有意地调节RNAi序列的激活。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号