首页> 外国专利> 2 METHOD FOR PRODUCING A SUBSTRATE HAVING A COLORED INTERFERENCE FILTER LAYER SAID SUBSTRATE COMPRISING A COLORED INTERFERENCE FILTER LAYER AND AN ARRAY COMPRISING AT LEAST TWO OF SAID SUBSTRATES

2 METHOD FOR PRODUCING A SUBSTRATE HAVING A COLORED INTERFERENCE FILTER LAYER SAID SUBSTRATE COMPRISING A COLORED INTERFERENCE FILTER LAYER AND AN ARRAY COMPRISING AT LEAST TWO OF SAID SUBSTRATES

机译:2生产具有彩色干扰过滤层的基质的方法,所述基材包含彩色干扰过滤层和包含至少两个上述基带的阵列

摘要

The present invention relates to a method of producing a substrate with a colored interfering filter layer comprising a polycrystalline metal oxide (s), in particular via physical or chemical vapor deposition using a sputtering gas, using a coating apparatus, wherein the polycrystalline metal oxide Two or more, in particular six or more, coating layers are deposited from the vapor phase upwards and downwards, and the average thickness of each coating layer is in the range of about 50 nm to 350 nm, especially in the range of about 90 nm to 210 nm, The average atomic content based on the percentage of one or more metals, in particular all individual metals, contained in all coating layers is less than +/- 20 atomic%, preferably less than +/- 10 atomic%, from the average compositional ratio of the respective metals in the interference filter layer, Particularly preferably +/- 5 atomic% or less, and 100 atomic% represents the sum of all the metals contained in the layer. The invention further relates to a colored substrate obtainable by this method and to an array comprising such a plurality of substrates.
机译:本发明涉及一种特别是通过使用溅射设备,通过物理或化学气相沉积,使用溅射设备,通过涂覆设备来制造具有包括多晶金属氧化物的有色干涉滤光层的基板的方法,其中多晶金属氧化物从气相向上或向下沉积一层或多层以上,特别是六个或以上的涂层,并且每个涂层的平均厚度在约50nm至350nm的范围内,特别是在约90nm至350nm的范围内。 210nm,基于所有涂层中包含的一种或多种金属,特别是所有单独的金属的百分比的平均原子含量,相对于碳原子数小于+/- 20原子%,优选小于+/- 10原子%。干涉滤光层中各金属的平均组成比,特别优选为+/- 5原子%以下,原子百分率表示该层中所含的所有金属的总和。本发明还涉及可通过该方法获得的有色基材以及包含该多种基材的阵列。

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