首页> 外国专利> 3 THREE-DIMENSIONAL ARRAY OF RE-PROGRAMMABLE NONVOLATILE MEMORY ELEMENTS HAVING VERTICAL BIT LINES AND A DOUBLE-GLOBAL-BIT-LINE ARCHITECTURE

3 THREE-DIMENSIONAL ARRAY OF RE-PROGRAMMABLE NONVOLATILE MEMORY ELEMENTS HAVING VERTICAL BIT LINES AND A DOUBLE-GLOBAL-BIT-LINE ARCHITECTURE

机译:3具有垂直位线和双全局位线结构的可重编程非易失性内存元素的三维数组

摘要

The present invention provides a three-dimensional array that is specially adapted to memory elements that invert the level of electrical conductivity in response to a voltage difference applied to the memory elements. Memory elements are formed intersecting a plurality of planes located at different distances on a semiconductor substrate. A two-dimensional array of bit lines to which memory elements of all planes are connected is oriented vertically through the plurality of planes from the substrate. A dual global bit line architecture provides a pair of global bit lines for each bit line to connect to a row of memory elements in parallel. While the second pair of each pair allows the local bit lines in the adjacent column to set the correct voltage to remove the leakage current between adjacent rows of local bit lines, the first pair of each pair is sensed .
机译:本发明提供了一种三维阵列,其特别适合于响应于施加到存储元件的电压差而反转电导率水平的存储元件。存储元件形成为与位于半导体衬底上的不同距离的多个平面相交。所有平面的存储元件所连接到的位线的二维阵列从基板通过多个平面垂直取向。双全局位线体系结构为每条位线提供一对全局位线,以并行连接到一行存储元件。虽然每对的第二对允许相邻列中的局部位线设置正确的电压以消除在局部位线的相邻行之间的泄漏电流,但是每对的第一对被感测。

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