SURFACE MICROSTRUCTURE MEASURING METHOD SURFACE MICROSTRUCTURE MEASUREMENT DATA ANALYZING METHOD AND X-RAY SCATTERING MEASURING DEVICE

摘要

Provided are a surface microstructure measurement method, a surface microstructure measurement program, and an X-ray scattering intensity measurement apparatus capable of accurately measuring a fine structure of a surface and evaluating three-dimensional structural characteristics.In the surface microstructure measuring method, X-rays are irradiated to the surface of the sample at a small angle of incidence to measure the scattering intensity, and one or plural layers are formed in the direction perpendicular to the surface by the fine structure on the surface, A sample model in which unit structures are periodically arranged in a direction parallel to the surface is assumed and a scattering intensity of X-rays scattered by the microstructure is calculated in consideration of the effect of refraction and reflection caused by the layer, The scattering intensity of the X-ray calculated by the model is fitted to the measured scattering intensity. Thus, the optimum value of the parameter specifying the shape of the unit structure is determined as a result of the fitting. As a result, the fine structure can be accurately measured.;