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ELECTRONIC DEVICE INCLUDING DOPED REGIONS BETWEEN CHANNEL AND DRAIN REGIONS AND A PROCESS OF FORMING THE SAME

机译:电子设备,包括通道和漏极区域之间的分隔区域和形成相同区域的过程

摘要

The electronic device may include a drain region of the transistor, and the drain region has a first conductivity type. The electronic device may also include a channel region of the transistor, and the channel region has a second conductivity type opposite to the first conductivity type. The electronic device may further include a first doped region having a first conductivity type, wherein the first doped region extends from the drain region toward the channel region. The electronic device may further include a second doped region having a first conductivity type and a second doped region disposed between the first doped region and the channel region.;
机译:电子设备可以包括晶体管的漏极区,并且漏极区具有第一导电类型。电子设备还可包括晶体管的沟道区,并且沟道区具有与第一导电类型相反的第二导电类型。该电子设备可以进一步包括具有第一导电类型的第一掺杂区,其中该第一掺杂区从漏极区向沟道区延伸。所述电子设备可以进一步包括:具有第一导电类型的第二掺杂区域;以及设置在所述第一掺杂区域和所述沟道区域之间的第二掺杂区域。

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