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ELECTRONIC DEVICE INCLUDING DOPED REGIONS BETWEEN CHANNEL AND DRAIN REGIONS AND A PROCESS OF FORMING THE SAME
ELECTRONIC DEVICE INCLUDING DOPED REGIONS BETWEEN CHANNEL AND DRAIN REGIONS AND A PROCESS OF FORMING THE SAME
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机译:电子设备,包括通道和漏极区域之间的分隔区域和形成相同区域的过程
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摘要
The electronic device may include a drain region of the transistor, and the drain region has a first conductivity type. The electronic device may also include a channel region of the transistor, and the channel region has a second conductivity type opposite to the first conductivity type. The electronic device may further include a first doped region having a first conductivity type, wherein the first doped region extends from the drain region toward the channel region. The electronic device may further include a second doped region having a first conductivity type and a second doped region disposed between the first doped region and the channel region.;
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