DEFECT ANALYSIS ASSISTANCE DEVICE PROGRAM EXECUTED BY DEFECT ANALYSIS ASSISTANCE DEVICE AND DEFECT ANALYSIS SYSTEM

摘要

Conventionally, no method for automatically selecting a layer to be the target overlap, the layers are superimposed by the target in many cases, there is a problem that needs a lot of time to the selection operation of the layer. An object of the present invention, by overlapping the analysis target defect image and the design layout data, in that possible defective image analysis apparatus and a defect image analysis system for identifying a pattern or a layer that a fault occurs, selecting the layer from the design layout data, to improve the efficiency of operations. An analysis target image to generate a plurality of layer division image by dividing each layer corresponding to the manufacturing process, for each layer, segmented image obtaining the match degree of the each of the design layer, the design layout data, the match degree is equal to the highest of each of the design layer, It characterized by a specific design layer, the design layer corresponding to the layer-divided image.