RUTHENIUM COMPLEX MIXTURE METHOD FOR PRODUCING SAME COMPOSITION FOR FORMING FILM RUTHENIUM-CONTAINING FILM AND METHOD FOR PRODUCING SAME

摘要

In order to form a high-quality ruthenium thin film by the CVD method, it is necessary to form the thin film at a low temperature. Thus, there was a desire for ruthenium compounds with high reactivity to heat. The present invention relates to a ruthenium complex mixture comprising (2,4-dimethylpentadienyl) (ethylcyclopentadienyl) ruthenium and bis (2,4-dimethylpentadienyl) ruthenium as raw materials Wherein the amount of bis (2,4-dimethylpentadienyl) ruthenium is (2,4-dimethylpentadienyl) (ethylcyclopentadienyl) ruthenium Enyl) ruthenium.;