- METHOD FOR CONTROLLING THE SYNTHESIS OF A BLOCK COPOLYMER CONTAINING AT LEAST ONE NONPOLAR BLOCK AND AT LEAST ONE POLAR BLOCK AND USE OF SAID BLOCK COPOLYMER IN APPLICATIONS OF NANOLITHOGRAPHY BY DIRECT SELF-ASSEMBLY

摘要

A method for controlling the synthesis of a block copolymer containing two or more blocks, comprising at least one non-polar block and at least one polar block, said method being capable of controlling the ratio between the blocks and the molecular weight of each block in particular Wherein the copolymer is a block copolymer intended to be used as a mask in a method of direct nano-lithography by self-assembling (DSA), the control being carried out in a semi-continuous anionic polymerization in an aprotic polar apolar medium Comprising the steps RTI ID = 0.0 of: Synthesizing the first non-polar block in the form of a macro-initiator, - preparing a solution of the macro-initiator as previously synthesized by mixing with an alkali metal alcoholate in an aprotic apolar solvent, Preparing a solution of a polar monomer in an aprotic polar aprotic solvent, - injecting the two solutions previously prepared with the macro-initiator and the polar monomer into a micro-mixer connected to the polymerization reactor at a constant flow rate, - recovering the copolymer obtained.