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METHOD OF FORMING SILICON MICROSTRUCTURES 3D METAL-STIMULATED ETCHING
METHOD OF FORMING SILICON MICROSTRUCTURES 3D METAL-STIMULATED ETCHING
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机译:硅微结构3D金属刺激蚀刻的形成方法
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摘要
FIELD: physics.;SUBSTANCE: invention relates to the technology to generate 3D silicon microstructures are element base of functional microelectronics, metal-stimulated etching using locally located masks Ni. The composition of the solution for etching Silicon include hydrofluoric acid, hydrogen peroxide and deionized water in a volumetric ratio of 2:1:10.;EFFECT: etching process using nickel is a cost-effective process because you can replace expensive noble metals and cheaper technology to create Silicon 3D structures.
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