首页> 外国专利> ADJUSTMENT OF DISTANCE FROM SOURCE LATTICE TO PHASE LATTICE FOR MULTIPLE ORDER PHASE SETTINGS IN DIFFERENTIAL PHASE-CONTRAST IMAGING

ADJUSTMENT OF DISTANCE FROM SOURCE LATTICE TO PHASE LATTICE FOR MULTIPLE ORDER PHASE SETTINGS IN DIFFERENTIAL PHASE-CONTRAST IMAGING

机译:微分相衬成像中多阶相设置从源晶格到相晶格的距离调整

摘要

FIELD: medicine.;SUBSTANCE: system includes a differential phase-contrast installation with an x-ray source and detector, a layout of lattices containing a source lattice, a phase lattice and an analyzer lattice, whwhere the source lattice is located between the x-ray source and the phase lattice, and the analyzer lattice is located between the phase lattice and the detector, and a movement arrangement for relative movement between the researched object and at least one lattice, a processing unit and a source lattice displacement arrangement. The phase lattice, the analyzer lattice and the detector are provided as a fixed interferometer unit. The phase lattice and the analyzer lattice are installed parallel to each other. The source lattice is unbalanced relative to the interferometer unit so that moire interference fringes can be detected in the detector plane. The processing unit is adapted to detect the moire fringes in the signals issued by the detector with x-rays, and is further configured to compute the source lattice movement signal to achieve a predetermined moire pattern. The movement arrangement is configured to adjust the location of the source lattice at least in the x-ray projection direction based on the displacement signal magnitude, so that at least one moire strip appeares across the width D of the detector. The method is implemented through system operation. The computer-readable storage medium contains instructions for method steps implementation by the system.;EFFECT: use of inventions allows to simplify adjustment and regulation of the differential phase-contrast imaging system.;7 cl, 5 dwg
机译:领域:医学;实体:系统包括具有X射线源和检测器的差分相衬装置,包含源晶格,相晶格和分析仪晶格的晶格布局,其中源晶格位于x射线之间射线源和相位晶格,以及分析仪晶格位于相位晶格和检测器之间,以及用于在被研究物体和至少一个晶格之间进行相对运动的运动装置,处理单元和源晶格位移装置。相位晶格,分析仪晶格和检测器作为固定的干涉仪单元提供。相位晶格和分析仪晶格彼此平行安装。源晶格相对于干涉仪单元不平衡,因此可以在检测器平面中检测出莫尔条纹。处理单元适于用X射线检测由检测器发出的信号中的莫尔条纹,并且还被配置为计算源晶格运动信号以实现预定的莫尔图案。移动装置被配置为基于位移信号幅度至少在x射线投影方向上调节源晶格的位置,使得至少一个莫尔条纹出现在检测器的宽度D上。该方法是通过系统操作来实现的。该计算机可读存储介质包含用于系统实现方法步骤的指令。效果:发明的使用允许简化差分相衬成像系统的调整和调节。7 cl,5 dwg

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