Illumination system for EUV projection exposure apparatus, EUV projection exposure apparatus with illumination system and method for operating an EUV projection exposure apparatus

摘要

An Illumination System (ILL) for an EUV Projection Exposure Facility (WSC) is designed to receive EUV radiation (LR) from an EUV radiation source (LS) and to form illumination radiation (ILR) from at least a portion of the received EUV radiation. The EUV radiation source is arranged in a separate from the illumination system source module (SM), which generates at a source position (SP) in an entrance plane (IS) of the illumination system, a secondary radiation source (SLS). To determine the adjustment state of the secondary radiation source with respect to the illumination system, the illumination system has an adjustment state determination system (ADS). The illumination system has an exchangeable mirror module (MM) which has a useful mirror element (UM) and an adjustment mirror element (AM), wherein in the exposure mode the useful mirror element contributes to the shaping of the illumination radiation incident on the illumination field and the adjustment mirror element reflects a portion of the EUV radiation of the secondary radiation source in the direction of an adjustment detector. The illumination system is associated with an optical adjustment auxiliary component (AAC), with the aid of an adjustment auxiliary signal (AAS, AAS ') can be generated, which allows a review of the Justagezustands the secondary radiation source or the Justagezustands the Justage mirror element after replacement of the mirror module ,