METHOD FOR MANUFACTURING NANOSTRUCTURES IN MICROMECHANICAL COMPONENTS AND MICROMECHANICAL COMPONENTS OBTAINED

摘要

Method of using a semiconductor substrate (10), depositing and structuring a catalytic material on the front side of the substrate (10), applying and structuring the sacrificial material on the catalytic material, depositing and structuring the contact material (40) on the front side (11) and on the sacrificial material, removing the sacrificial material by forming etch accesses between the contact material (40) and the catalytic material and developing etching trenches (7).