首页> 外国专利> METHOD FOR ENGRAVING IMAGES WITH RADIATION ON A RADIATION SENSITIVE LAYER, ESPECIALLY FOR LASER ENGRAVING

METHOD FOR ENGRAVING IMAGES WITH RADIATION ON A RADIATION SENSITIVE LAYER, ESPECIALLY FOR LASER ENGRAVING

机译:在辐射敏感层上雕刻带有辐射的图像的方法,尤其是用于激光雕刻

摘要

The invention relates to a method for engraving images into a radiation-sensitive layer by means of radiation, in particular for laser engraving. The layer is irradiated point by point such that a blackening (Sist(Pi,k)) is achieved for an image point (Pi,k), said blackening corresponding to a grayscale specified for said image point (Pi,k). In order to allow high-quality images to be engraved in a single engraving pass, the achieved blackening (Sist(Pi,k)) is ascertained for the image point (Pi,k); the difference (DeltaSi,k) between the ascertained blackening (Sist(Pi,k)) and a specified blackening (Ssoll(Pi,k)) is calculated; and the difference (DeltaSi,k) is divided between at least two adjacent image points (Rhoi,k+n; Pi+n,k+m) which are yet to be irradiated.
机译:用于将图像雕刻到辐射敏感层中的方法技术领域本发明涉及一种通过辐射将图像雕刻成辐射敏感层的方法,特别是用于激光雕刻的方法。逐层地照射该层,使得对于图像点(Pi,k)实现黑化(Sist(Pi,k)),所述黑化对应于为所述图像点(Pi,k)规定的灰度级。为了允许在单次雕刻过程中雕刻出高质量的图像,要确定图像点(Pi,k)的变黑(Sist(Pi,k));计算确定的黑化(Sist(Pi,k))与指定的黑化(Ssoll(Pi,k))之间的差(DeltaSi,k);差值(DeltaSi,k)被划分为至少两个尚未被照射的相邻图像点(Rhoi,k + n; Pi + n,k + m)。

著录项

  • 公开/公告号EP2880850B1

    专利类型

  • 公开/公告日2018-09-05

    原文格式PDF

  • 申请/专利权人 BUNDESDRUCKEREI GMBH;

    申请/专利号EP20130750276

  • 发明设计人 KRAMER THOMAS;

    申请日2013-07-31

  • 分类号H04N1/00;H04N1/40;

  • 国家 EP

  • 入库时间 2022-08-21 13:19:13

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