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GLOW DISCHARGE SPECTROSCOPY METHOD AND SYSTEM FOR MEASURING IN SITU THE ETCH DEPTH OF A SAMPLE
GLOW DISCHARGE SPECTROSCOPY METHOD AND SYSTEM FOR MEASURING IN SITU THE ETCH DEPTH OF A SAMPLE
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机译:原位测量样品刻蚀深度的辉光放电光谱学方法和系统
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摘要
A glow discharge spectrometry system includes a glow discharge lamp suitable for receiving a solid sample (10) and forming a glow discharge etching plasma (19). The system (100) for measuring in situ the depth of the erosion crater generated by etching of the sample (10) includes an optical separator (3), optical elements (4) suitable for directing a first incident beam (21) toward a first zone (11) of the sample, the first zone being exposed to the etching plasma, and a second incident beam (22) toward a second zone (12) of the same side of the sample, the second zone being protected from the etching plasma, respectively, and an optical recombining device (3) suitable for forming an interferometric beam (30) so as to determine the depth (d) of the erosion crater.
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