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ROOM TEMPERATURE METHOD FOR THE PRODUCTION OF ELECTROTECHNICAL THIN LAYERS, THE USE OF SAME, AND A THIN LAYER HEATING SYSTEM OBTAINED IN THIS MANNER
ROOM TEMPERATURE METHOD FOR THE PRODUCTION OF ELECTROTECHNICAL THIN LAYERS, THE USE OF SAME, AND A THIN LAYER HEATING SYSTEM OBTAINED IN THIS MANNER
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机译:用于生产电工薄层的室温方法,相同方法的使用以及采用这种方式的薄层加热系统
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摘要
Electrotechnical thin layers which can be used as a heating resistor and/or substrate for conductive layers are produced, in established methods, at high prices and extremely slowly. This problem is solved by virtue of a redox-reactively-deposited base layer which contains graphite, is formed at room temperature and on which, in the same sense, a metal forms a micrometer-scale metal layer within minutes to a few seconds by means of a redox reaction, at room temperature and during the definitive curing process. The double layer made available in this manner is highly flexible, allows soldering on copper layers, and can be used particularly advantageously as a thin-layer heating system.
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