CVD APPARATUS FOR GROWING CARBON NANO STRUCTURE AND CARBONIZATION PROCESSING METHOD FOR INSIDE OF PROCESSING FURNACE OF CVD APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a CVD apparatus for growing a carbon nano structure, the CVD apparatus being capable of reversely controlling raw material gas consumed other than for growth of the carbon nano structure from a surface of an object to be processed.SOLUTION: A CVD apparatus M according to the invention includes a processing furnace 1 in which an object to be treated is disposed, gas introduction means 21, 22 for introducing raw material gas including carbon to inside the processing furnace, and heating means 3 heating the raw material gas. The CVD apparatus has a surface layer of a part contacting with the raw material gas inside the processing furnace, the surface layer being composed of a nickel carbon layer 12 containing an equivalent amount of 30 at% or more of nickel and carbon each.SELECTED DRAWING: Figure 2