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MEASURED HEIGHT CORRECTION RULE GENERATING DEVICE AND METHOD, AND HEIGHT MEASURING DEVICE AND METHOD

机译:测高校正规则生成装置和方法,以及测高装置和方法

摘要

PROBLEM TO BE SOLVED: To provide a measured height correction rule generating device and method, and a height measuring device and method.;SOLUTION: The measured height correction rule generating method comprises the phases of: acquiring first data including a height from a reference plane 50 at one or more positions on a sample 40A; generating a first mask including a scale factor relating to the height of a first position among the one or more positions, the scale factor being determined based on a relative relation between the height of the first position and a reference height; generating a second mask including a first correction rule relating to the height of the first position, the first correction rule being determined based on a relative relation between the height of the first position and a height of one or more second positions adjacent to the first position; and calculating a ratio of the height of the fist position to the height of a third position which is in an already set relation with the first position and generating a third mask including a second correction rule relating to the height of the first position, the second correction rule being determined based on a relative relation between the calculated ratio and an average ratio.;SELECTED DRAWING: Figure 2;COPYRIGHT: (C)2018,JPO&INPIT
机译:解决的问题:提供一种测量的高度校正规则产生装置和方法,以及一种高度测量装置和方法。解决方案:测量的高度校正规则产生方法包括以下阶段:从参考平面获取包括高度的第一数据。在样品40A上一个或多个位置上的50;产生包括与一个或多个位置中的第一位置的高度有关的比例因子的第一掩模,该比例因子基于第一位置的高度与参考高度之间的相对关系来确定;生成包括与第一位置的高度有关的第一校正规则的第二掩模,该第一校正规则基于第一位置的高度和与第一位置相邻的一个或多个第二位置的高度之间的相对关系来确定;计算第一位置的高度与已经与第一位置设定的关系的第三位置的高度之比,并生成包括与第一位置的高度有关的第二校正规则的第三掩模。校正规则是基于所计算的比率与平均比率之间的相对关系确定的;选定的图纸:图2;版权:(C)2018,JPO&INPIT

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