PHOTOCROSSLINKABLE POLYMER, INSULATION FILM, FLATTENED FILM, REPELLENT PATTERNING FILM, AND ORGANIC FIELD EFFECT TRANSISTOR DEVICE CONTAINING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a resin excellent in solvent solubility, crosslinking, solvent resistance, insulation fracture strength, current leakage, solvent wettability, and surface smoothness.;SOLUTION: A resin comprises formula (1), and a repeating unit obtained by introducing a specific photocyclizable compound such as a cinnamic acid derivative into the formula (1), of 20 mol% or more (R₁ is H or a C1-C6 alkyl group, S₁ is -O- or -C(O)-, p is 0 or 1, A₁ is a C6-C19 aryl group, Y is halogen, a cyano group, a carboxyalkyl group, an alkyl ether group, an aryl ether group, a C1-C18 alkyl group, a fluoroalkyl group, or a cycloalkyl group. k is an integer of 0 to (s-1). s is the number of carbon atoms constituting an aromatic group A₁).;SELECTED DRAWING: None;COPYRIGHT: (C)2019,JPO&INPIT