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METHOD FOR PRODUCING SILICA PARTICLE, SILICA PARTICLE, AND CHEMICAL MECHANICAL POLISHING COMPOSITION
METHOD FOR PRODUCING SILICA PARTICLE, SILICA PARTICLE, AND CHEMICAL MECHANICAL POLISHING COMPOSITION
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机译:制备二氧化硅颗粒,二氧化硅颗粒和化学机械抛光组合物的方法
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摘要
PROBLEM TO BE SOLVED: To provide a method for producing silica particles that can achieve both dispersion stability and polishing properties, silica particles, and a chemical mechanical polishing composition containing the produced silica particles.;SOLUTION: A method for producing silica particles according to the present invention includes hydrolyzing compound A and compound B. Silica particles according to the present invention contain N atoms and Si atoms, and with the mol of N atoms defined as MN and the mol of Si atoms defined as MSi, MN/MSi=0.001-0.03.;SELECTED DRAWING: None;COPYRIGHT: (C)2018,JPO&INPIT
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机译:要解决的问题:提供一种能够同时实现分散稳定性和抛光性能的二氧化硅颗粒的生产方法,二氧化硅颗粒以及包含所生产的二氧化硅颗粒的化学机械抛光组合物。本发明包括水解化合物A和化合物B。根据本发明的二氧化硅颗粒包含N个原子和Si原子,并且N原子的摩尔定义为M N Sub>,Si原子的摩尔定义为M Si Sub>,M N Sub> / M Si Sub> = 0.001-0.03 .;选定的图纸:无;版权所有:(C)2018,JPO&INPIT
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