RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMING METHOD, METHOD FOR PRODUCING ACID DIFFUSION CONTROLLER, AND METHOD FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition that can effectively reduce defects.SOLUTION: A radiation-sensitive resin composition contains a polymer having an acid dissociable group, a compound having an anion represented by formula (1), and a solvent. X is selected from -C(=O) Y, -C(=O) OY, -C(=O) NYY', -S(=O)Y, -S(=O)OY, -S(=O)NYY', -C(=O) OC(=O) Y, and -C(=O) N(Y) C(=O) Y'. R, R, R, R, Y and Y' are a hydrogen atom or a C1-C20 monovalent organic group, or a 3-20 membered ring structure in which Y or Y' and R, Y or Y' and R, Y or Y' and R, or Y or Y' and Rbind to each other. Rand Rare a fluorine atom or a C1-C4 monovalent fluorinated hydrocarbon group.SELECTED DRAWING: None