METHOD AND APPARATUS FOR PROVIDING ANISOTROPIC AND MONO-ENERGETIC NEUTRAL BEAM BY NON-AMBIPOLAR ELECTRON PLASMA

摘要

PROBLEM TO BE SOLVED: To provide an apparatus to treat a substrate.SOLUTION: An apparatus includes: a first plasma chamber for forming a first plasma at a first plasma potential; a second plasma chamber for forming a second plasma at a second potential greater than the first plasma potential; a separation member which is disposed between the first plasma chamber and the second plasma chamber and which allows electrons to be transferred between the first plasma chamber and the second plasma chamber; and a holder which is disposed adjacent to the second plasma chamber to be apart from the separation member and which has a neutralizer grid including one or two or more of SiO, quartz, HfO, YO, and aluminum oxide.SELECTED DRAWING: Figure 13