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Method and apparatus for laser processing of silicon by filamentation of burst ultrafast laser pulses

机译:通过突发超快激光脉冲的细丝化处理对硅进行激光加工的方法和设备

摘要

A method for laser processing of Silicon includes placing a Kerr material into engagement with the Silicon forming an interface therebetween. A laser beam is applied having at least one subpulse in a burst envelope operating at a first wavelength. The laser beam passes through a distributive lens focusing assembly and to the Kerr material. The first wavelength is modified to a plurality of second wavelengths, some of which are effective for processing Silicon. Photoacoustic compression processing is produced by the laser pulse energy by a portion of second wavelengths delivered through the interface and to the Silicon which initiates Kerr Effect self-focusing which is propagated in the Silicon by additional energy input to the Silicon thus producing a filament within the Silicon.
机译:一种用于硅的激光加工的方法,包括将Kerr材料与硅接合以在其之间形成界面。施加具有在第一波长下工作的脉冲包络中具有至少一个子脉冲的激光束。激光束穿过分布式透镜聚焦组件并到达Kerr材料。将第一波长修改为多个第二波长,其中一些对处理硅有效。光声压缩处理是由激光脉冲能量产生的,通过界面和硅传递的一部分第二波长的光会引发Kerr效应自聚焦,并通过输入到硅的附加能量在硅中传播克尔效应自聚焦,从而在硅中产生细丝硅。

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