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Brittle material substrate cleaving method and brittle material substrate cleaving apparatus

机译:脆性材料基板的切割方法和脆性材料基板的切割装置

摘要

The present invention is a brittle substrate (W) cleavage device (20) for cleaving a brittle substrate (W) along an intended cleavage line (L). The cleavage device is equipped with: a processing pedestal (3) on which the brittle substrate (W) is placed; a leading end fissure-forming unit (21) for forming a leading end fissure (41) as an initial fissure on the intended cleavage line (L) of the brittle substrate (W) at the leading end in the direction of movement when moving the brittle substrate (W); an end fissure-forming unit (22) for forming an end fissure (42) as an initial fissure on the intended cleavage line (L) of the brittle substrate (W) at the back end in the direction of movement when moving the brittle substrate (W); a laser irradiation unit (23) for irradiating laser light (C) on the brittle substrate (W); a refrigerant-spraying unit (24) for spraying a refrigerant (R) on the brittle substrate (W); and a movement means (25) for moving the brittle substrate (W) in a previously set direction with respect to the laser irradiation unit (23) and the refrigerant-spraying unit (24).
机译:本发明是一种用于沿着预定的切割线(L)切割脆性基板(W)的脆性基板(W)切割装置(20)。切割装置具备:在其上载置有脆性基板(W)的处理台座(3);和前端裂纹形成单元(21),其用于在脆性基板(W)的移动方向上的移动方向上,在前端的脆性基板(W)的目标切割线(L)上形成作为初始裂纹的前端裂纹(41)。脆性基材(W);端部裂纹形成单元(22),其在移动脆性基板时,在移动方向上,在后端的脆性基板(W)的目标切割线(L)上,在移动方向上形成作为初始裂纹的端部裂纹(42)。 (W);激光照射单元(23),用于向脆性基板(W)照射激光(C)。制冷剂喷射单元(24),用于在脆性基板(W)上喷射制冷剂(R)。移动装置(25)使脆性基板(W)相对于激光照射单元(23)和制冷剂喷射单元(24)沿预先设定的方向移动。

著录项

  • 公开/公告号JP6269830B2

    专利类型

  • 公开/公告日2018-01-31

    原文格式PDF

  • 申请/专利权人 株式会社IHI;

    申请/专利号JP20160527730

  • 发明设计人 山田 淳一;

    申请日2015-05-26

  • 分类号B28D5;B28D1/22;C03B33/09;C03B33/03;C03B33/037;

  • 国家 JP

  • 入库时间 2022-08-21 13:07:32

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