首页> 外国专利> TOP-GATE THIN FILM TRANSISTOR, MANUFACTURING METHOD THEREOF, ARRAY SUBSTRATE AND DISPLAY PANEL COMPRISING TOP-GATE THIN FILM TRANSISTOR

TOP-GATE THIN FILM TRANSISTOR, MANUFACTURING METHOD THEREOF, ARRAY SUBSTRATE AND DISPLAY PANEL COMPRISING TOP-GATE THIN FILM TRANSISTOR

机译:顶部栅极薄膜晶体管,其制造方法,矩阵基板和包括顶部栅极薄膜晶体管的显示面板

摘要

The present disclosure provides a top-gate thin film transistor, a manufacturing method thereof, and an array substrate and a display panel each comprising the top-gate thin film transistor. The top-gate thin film transistor comprises a light-shielding layer formed between the base substrate and the active layer and made of a non-metallic material. The non-metallic material may be a silicone material, such as a polyhedral oligomeric silsesquioxane or a linear silicone resin.
机译:本公开提供了一种顶栅薄膜晶体管,其制造方法以及分别包括该顶栅薄膜晶体管的阵列基板和显示面板。顶栅薄膜晶体管包括形成在基底基板和有源层之间并且由非金属材料制成的遮光层。非金属材料可以是硅树脂材料,例如多面体低聚倍半硅氧烷或线性硅树脂。

著录项

  • 公开/公告号US2018294360A1

    专利类型

  • 公开/公告日2018-10-11

    原文格式PDF

  • 申请/专利权人 BOE TECHNOLOGY GROUP CO. LTD.;

    申请/专利号US201715822429

  • 发明设计人 JIANYE ZHANG;WEI LI;XING ZHANG;

    申请日2017-11-27

  • 分类号H01L29/786;H01L29/66;H01L27/12;C08G77/04;C08G77/26;G03F7/075;G03F7/038;

  • 国家 US

  • 入库时间 2022-08-21 13:02:40

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