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NEGATIVE PATTERNING APPROACH FOR ULTRA-NARROW GAP DEVICES
NEGATIVE PATTERNING APPROACH FOR ULTRA-NARROW GAP DEVICES
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机译:超窄缝设备的负图案化方法
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摘要
A method for manufacturing a gap device includes forming a template structure on a substrate, depositing an active material layer on the substrate and on the template structure, wherein the active material layer covers at least top and side surfaces of the template structure, planarizing the active material layer, and selectively removing the template structure with respect to the active material layer and the substrate.
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