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Method for grouping region of interest of mask pattern and measuring critical dimension of mask pattern using the same
Method for grouping region of interest of mask pattern and measuring critical dimension of mask pattern using the same
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机译:将掩模图案的关注区域分组并使用掩模图案的临界尺寸进行测量的方法
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摘要
A method for measuring a critical dimension of a mask pattern, including generating a mask pattern using an optically proximity-corrected (OPC) mask design including at least one block; measuring a first critical dimension of a target-region of interest (target-ROI) including neighboring blocks having a same critical dimension (CD), in the mask pattern; determining a group region of interest including the target-ROI and at least one neighboring block adjacent to the target-ROI; measuring second CDs of the neighboring blocks of the group region of interest; and correcting a measuring value of the first CD using a measuring value of the second CDs.
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