首页> 外国专利> Reducing algorithmic inaccuracy in scatterometry overlay metrology

Reducing algorithmic inaccuracy in scatterometry overlay metrology

机译:减少散射测量叠加计量学中的算法误差

摘要

Methods and systems for minimizing of algorithmic inaccuracy in scatterometry overlay (SCOL) metrology are provided. SCOL targets are designed to limit the number of oscillation frequencies in a functional dependency of a resulting SCOL signal on the offset and to reduce the effect of higher mode oscillation frequencies. The targets are segmented in a way that prevents constructive interference of high modes with significant amplitudes, and thus avoids the inaccuracy introduced by such terms into the SCOL signal. Computational methods remove residual errors in a semi-empirical iterative process of compensating for the residual errors algorithmically or through changes in target design.
机译:提供了用于最小化散射测量叠加(SCOL)度量中的算法误差的方法和系统。 SCOL目标的设计目的是根据所产生的SCOL信号对偏移量的函数依赖性限制振荡频率的数量,并减少较高模式的振荡频率的影响。目标的分割方式可以防止高模具有明显振幅的相长干涉,从而避免此类项将误差引入SCOL信号。计算方法在算法或通过目标设计更改来补偿残余误差的半经验迭代过程中消除了残余误差。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号