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Method of forming amorphous carbon monolayer and electronic device including amorphous carbon monolayer
Method of forming amorphous carbon monolayer and electronic device including amorphous carbon monolayer
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机译:形成非晶碳单层的方法和包括非晶碳单层的电子器件
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摘要
A method of forming an amorphous carbon monolayer (ACM) and an electronic device including the ACM are provided. The method includes forming the ACM on a surface of a germanium (Ge) substrate via a chemical vapor deposition (CVD) process. The CVD process includes injecting a reaction gas including carbon-containing gas and hydrogen (H2) gas in to a reaction chamber containing the Ge substrate, wherein a partial pressure of the H2 gas in the reaction chamber may range from 1 Torr to 30 Torr.
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