Chemical vapor deposition process for depositing a titanium oxide coating

摘要

A chemical vapor deposition process for depositing a titanium oxide coating is provided. The chemical vapor deposition process for depositing the titanium oxide coating includes providing a glass substrate. A gaseous mixture is formed. The gaseous mixture includes a titanium-containing compound and a fluorine-containing compound. The titanium-containing compound is an oxygen-containing compound or the gaseous mixture includes a first oxygen-containing compound. The gaseous mixture is directed toward and along the glass substrate. The mixture reacts over the glass substrate to form the titanium oxide coating thereon.