Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device

摘要

There are provided A pattern formation method, including:(1) forming a film using an active light-sensitive or radiation-sensitive resin composition;(2) exposing the film to active light or radiation; and(3) developing the exposed film using a developer including an organic solvent,wherein the active light-sensitive or radiation-sensitive resin composition contains a resin (A) having specific 3 repeating units.