PROCESS FLOW AND MECHANICAL MODELING OF RF MICRO-ELECTRO-MECHANICAL SYSTEM (MEMS) CAPACITIVE SWITCH

摘要

Method of providing minimized steps for development of Radio Frequency Micro-Electro-Mechanical System (RF MEMS) capacitive switch wherein, the invention relates to usage of three steps of photo-lithography for assembling complete structure of the switch. In one embodiment, the invention relates to the mechanical modeling of the switch in which the Nano scale dimensions include a substrate, an insulating layer upon which dielectric layer is deposited and a movable membrane having its ends supported at spaced location on the substrate, which when actuated, sags from its original default position to the position above the dielectric material. This movable membrane does not come in contact with the dielectric and forming the capacitance, allows passage of RF signal. This miniaturized modeling of the device helps in increasing the yield per wafer.