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METHOD FOR THE MEASUREMENT OF A MEASUREMENT OBJECT BY MEANS OF X-RAY FLUORESCENCE.
METHOD FOR THE MEASUREMENT OF A MEASUREMENT OBJECT BY MEANS OF X-RAY FLUORESCENCE.
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机译:用X射线荧光光谱测量物体的方法。
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摘要
The invention relates to a method for the measurement of a measurement object by means of X-ray fluorescence, in particular for the measurement of the thickness of thin layers or determination of an element concentration of a measurement object, in which a primary beam is directed from an X-ray radiation onto the measurement object, for which a secondary radiation emitted by the measurement object is detected by a detector and is relayed to an evaluation device in which the primary beam is moved within a grid surface which is divided into grid partial surfaces (1 . . . n) as well as subdivided into at least one line (Z1 . . . Zn) and at least one column (S1 . . . Sn), and for each grid partial surface (1 . . . n), a primary beam is directed onto the grid surface, a size of the grid surface is selected which covers at least the measurement surface of the measurement object, a scaling factor [alpha] is determined from a ratio of the size of the grid surface (31); to the size of the measurement surface of the measurement object, the detected spectrum of the secondary radiation is added up from the respective grid partial surfaces (1 . . . n), averaged and subsequently multiplied by the scaling factor [alpha] and the spectrum of the secondary radiation from the grid partial surfaces (1 . . . n) which is corrected with the scaling factor [alpha] is provided for the quantitative evaluation.
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