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DARK FIELD WAFER NANO-DEFECT INSPECTION SYSTEM WITH A SINGULAR BEAM
DARK FIELD WAFER NANO-DEFECT INSPECTION SYSTEM WITH A SINGULAR BEAM
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机译:具有单个光束的暗场晶片纳米缺陷检查系统
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摘要
Provided is a method, system, and apparatus for inspecting a substrate. The method comprises illuminating the substrate with a singular laser beam, the singular laser beam forming an illuminated spot on the substrate and a bright fringe at a surface of the substrate, the bright fringe extending over at least a portion of the illuminated spot, and detecting, by an optical detection system, scattered light from nano-defects present on the substrate within the illuminated spot.
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