ORGANIC-INORGANIC THIN FILM DEPOSITION APPARATUS AND ORGANIC-INORGANIC THIN FILM DEPOSITION METHOD

摘要

Provided is an organic-inorganic thin film deposition apparatus. An organic-inorganic thin film deposition apparatus according to one embodiment of the present invention may comprise: a first sub-chamber in which an atomic layer deposition module for depositing an atomic layer on a substrate is disposed; a second sub-chamber which communicates with the first sub-chamber so as to allow the entry of the substrate thereinto and in which a molecular layer deposition module for depositing a molecular layer on the substrate is disposed; and a blocking part for preventing intermingling of gas in the first sub-chamber and gas in the second sub-chamber.