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MICRO DEVICE TRANSFERRING METHOD, AND MICRO DEVICE SUBSTRATE MANUFACTURED BY MICRO DEVICE TRANSFERRING METHOD

机译:微设备转移方法,以及由微设备转移方法制造的微设备基板

摘要

The present invention relates to a method for transferring a micro device, comprising: a pressurization step; a first adhesive force forming step; a second adhesive force forming step; and a releasing step. The pressurization step enables a carrier film, in which the micro device is attached to an adhesive layer, and a substrate, on which a solder is applied onto a metal electrode, to contact each other and pressurize the same. In the first adhesive force forming step, a first adhesive force between the micro device and the solder is formed as the solder disposed between the micro device and the metal electrode is pressed by the pressurization step. In the second adhesive force forming step, a second adhesive force between the micro device and the adhesive layer is formed as the micro device is press-fitted into and bonded to the adhesive layer by the pressurization step. The releasing step releases the carrier film from the substrate, with the micro device adhered to the solder. The strength of the second adhesive force is proportional to a press-fitting depth at which the micro device is press-fitted into the adhesive layer, and the press-fitting depth of the micro device with respect to the adhesive layer is formed within a range in which the second adhesive force is formed to be smaller than the first adhesive force.
机译:本发明涉及一种用于转移微器件的方法,包括:加压步骤;以及第一粘合力形成步骤;第二粘合力形成步骤;和释放步骤。加压步骤使其中将微型器件附接到粘合层的载体膜和将焊料施加到金属电极上的基板彼此接触并对其加压。在第一粘合力形成步骤中,当通过加压步骤按压布置在微型器件与金属电极之间的焊料时,在微型器件与焊料之间形成第一粘合力。在第二粘合力形成步骤中,当通过加压步骤将微器件压入并粘合到粘合层中时,在微器件和粘合层之间形成第二粘合力。释放步骤使载体膜从基板上释放,并使微型器件粘附到焊料上。第二粘合力的强度与将微型器件压入粘合层的压入深度成正比,并且与微型器件相对于微型器件的压入深度成正比。粘合层形成在第二粘合力形成为小于第一粘合力的范围内。

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