首页> 外国专利> COMPOSITION, METHOD FOR MANUFACTURING FILM, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, METHOD FOR MANUFACTURING SOLID-STATE IMAGING ELEMENT, METHOD FOR MANUFACTURING IMAGE DISPLAY DEVICE, AND METHOD FOR MANUFACTURING INFRARED SENSOR

COMPOSITION, METHOD FOR MANUFACTURING FILM, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, METHOD FOR MANUFACTURING SOLID-STATE IMAGING ELEMENT, METHOD FOR MANUFACTURING IMAGE DISPLAY DEVICE, AND METHOD FOR MANUFACTURING INFRARED SENSOR

机译:组成,制造膜的方法,制造近红外切割滤波器的方法,制造固态成像元件的方法,制造图像显示装置的方法以及制造红外传感器的方法

摘要

Provided are a composition having good heat resistance and which is capable of forming a film in which fluctuation in spectral characteristics in the near-infrared region is suppressed even when humidity conditions during application vary, as well as a film, a near-infrared cut filter, a solid-state imaging element, an image display device, and a method for manufacturing an infrared sensor. The composition includes a near-infrared absorbing compound A having a π-conjugate plane including a monocyclic or condensed aromatic ring, and a solvent B, the solvent B including a solvent B1 for which the solubility parameter thereof is in the range of 19.9 MPa0.5 to 22.3 MPa0.5, and a solvent B2 for which the solubility parameter thereof is less than 19.9 Pa0.5 or exceeds 22.3 MPa0.5, and the content of the solvent B2 in the solvent B being no greater than 9% by mass.
机译:提供一种具有良好的耐热性并且能够形成即使在涂布时的湿度条件变化的情况下也能够抑制近红外区域的光谱特性的变动的膜的膜以及膜,近红外截止滤光器。 ,固态成像元件,图像显示装置以及用于制造红外传感器的方法。该组合物包含具有包含单环或稠合的芳环的π共轭面的近红外吸收性化合物A和溶剂B,该溶剂B包括其溶解度参数在19.9MPa <的范围内的溶剂B1。 Sup> 0.5 至22.3 MPa 0.5 ,并且溶剂B2的溶解度参数小于19.9 Pa 0.5 或超过22.3 MPa 0.5 ,并且溶剂B2在溶剂B中的含量不大于9质量%。

著录项

  • 公开/公告号WO2018047584A1

    专利类型

  • 公开/公告日2018-03-15

    原文格式PDF

  • 申请/专利权人 FUJIFILM CORPORATION;

    申请/专利号WO2017JP29339

  • 发明设计人 KITAJIMA SHUNSUKE;

    申请日2017-08-15

  • 分类号G02B5/22;C09K3;G03F7/004;G03F7/027;H01L27/144;H01L27/146;

  • 国家 WO

  • 入库时间 2022-08-21 12:45:08

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