首页> 外国专利> Composition, film manufacturing method, near-infrared cut filter manufacturing method, solid-state imaging device manufacturing method, image display device manufacturing method, and infrared sensor manufacturing method

Composition, film manufacturing method, near-infrared cut filter manufacturing method, solid-state imaging device manufacturing method, image display device manufacturing method, and infrared sensor manufacturing method

机译:组成,膜制造方法,近红外截止滤光器制造方法,固态成像装置制造方法,图像显示装置制造方法和红外传感器制造方法

摘要

Composition capable of forming a film having good heat resistance and suppressing variation in spectral characteristics in the near-infrared region even under different humidity conditions during coating, film, near-infrared cut filter, and solid-state imaging device An image display device and an infrared sensor manufacturing method are provided. The composition includes a near-infrared absorbing compound A having a π-conjugated plane including a single ring or a condensed aromatic ring, and a solvent B. The solvent B has a solubility parameter of 19.9 MPa0.5 or more and 22.3 MPa0.5. Solvent B1 in the following range and Solvent B2 having a solubility parameter of less than 19.9 Pa0.5 or a solubility parameter exceeding 22.3 MPa0.5, and the content of Solvent B2 in Solvent B is It is 9 mass% or less.
机译:甚至在涂覆,膜,近红外截止滤光器和固态成像装置期间,即使在不同的湿度条件下,也能够形成具有良好的耐热性的膜并抑制近红外区域的光谱特性变化的组合物,图像显示装置和显示装置提供了一种红外传感器的制造方法。该组合物包含具有包括单环或稠合的芳环的π共轭面的近红外吸收性化合物A和溶剂B。溶剂B的溶解度参数为19.9MPa0.5以上且22.3MPa0.5 。溶解度参数小于19.9Pa0.5或溶解度参数大于22.3MPa0.5的以下溶剂B1和溶剂B2在溶剂B中的含量为9质量%以下。

著录项

  • 公开/公告号JPWO2018047584A1

    专利类型

  • 公开/公告日2019-08-15

    原文格式PDF

  • 申请/专利权人 富士フイルム株式会社;

    申请/专利号JP20180538325

  • 发明设计人 北島 峻輔;

    申请日2017-08-15

  • 分类号G02B5/22;G03F7/004;G03F7/028;C09K3;H01L27/146;H01L27/144;

  • 国家 JP

  • 入库时间 2022-08-21 12:18:21

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