SUBSTRATE TREATMENT DEVICE, LIQUID FEEDSTOCK REPLENISHING SYSTEM, SEMICONDUCTOR DEVICE PRODUCTION METHOD, AND PROGRAM

摘要

The present invention suppresses variations in the value of in-plane uniformity of a film formed on a substrate. A substrate treatment device comprising: a treatment unit that includes a treatment chamber; a storage tank that stores a liquid feedstock, and is formed so as to include a wall portion and a bottom portion that has a recessed portion; a vaporization unit that vaporizes the liquid feedstock to generate a feedstock gas; a supply unit that supplies the feedstock gas to the treatment chamber; a continuous level sensor that detects the liquid level of the liquid feedstock stored in the storage tank, and has a sensor element disposed in the recessed portion; a replenishing unit that replenishes the liquid feedstock in the storage tank; and a control unit that controls the supply unit so as to supply the feedstock gas to the treatment chamber, whereby a substrate treatment is performed for treating a substrate, and controls the replenishing unit, on the basis of the liquid level of the liquid feedstock detected by the continuous level sensor each time the substrate treatment is performed a preset number of times, so as to replenish the liquid feedstock in the storage tank such that the liquid level of the liquid feedstock stored in the storage tank reaches a preset level.