A THIN-FILM COATING APPARATUS AND METHODS OF FORMING A THIN-FILM COATING

摘要

Embodiments of the present disclosure describe an apparatus for thin film coating comprising a coating device configured to deposit a solution on a substrate; and a dryer component configured to spin gas proximate to the deposited solution to dry the deposited solution and form a thin film coating. Embodiments of the present disclosure further describe a method of forming a thin-film coating comprising depositing a solution on a substrate and spinning a gas proximate to the deposited solution to dry the deposited solution and form a thin film coating.